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Fraunhofer ISIT - Production facilities





For its activities, Fraunhofer ISIT disposes of a 150 mm silicon technology line and 2500 m² of clean-room space. The institute has a further 450 m² of clean-room area (class 100) available for specific microsystems engineering processes. A further 200 m² clean-room (class 10-100) is equipped for chemical-mechanical polishing (CMP) and post-CMP cleaning.

 

Together with Vishay Semiconductor Itzehoe GmbH, the institute operates a professional semiconductor production line which is up-to-date in all required quality certifications. The line is used not only for producing microelectronic components (PowerMOS) and microsystems, but also for R&D projects aimed at developing new components and technological processes.

 

ISIT also offers a diverse selection of labs (1500 m²) that are utilised by working groups for the development of chemical, biological and thermal processes, electrical and mechanical component characterisation, and for assembly and interconnection technology. Moreover, ISIT has a pilot assembly line for lithium polymere accumulators for capacities in the range of 600-1000 mAh.




Last Update: 26.12.2009

© Gesellschaft für Technologieförderung Itzehoe mbH

Time line

 

1990 Fraunhofer ISIT foundation in Berlin
1992 Decision for relocation in Itzehoe
1995 Start of operation of the newly-errected institute in Itzehoe
1996 Cooperation with TEMIC
1997 Vishay takes over TEMIC
2004 Set-up of Vishay epitaxial fab-line
2004 Decision to upgrade 6 inch wafer PowerMOS production to 8 inch